Abstract: 　Self⁃assembled monolayer films of i⁃salicylaldehyde⁃o⁃phenylenediamine (A) and di⁃o⁃vanillin⁃o⁃phenylenediamine (B) were fabricated respectively on copper electrode surface by molecular self⁃assembled process. The corrosion inhibition performance of the Schiff bases self⁃assembled films (SAMs) in 3.5% NaCl solution was examined by electrochemical methods. The best corrosion inhibition rate of Schiff base A reached to 94.06% with the concentration of 10 mmol/L and assembly time of 4 h at 25 ℃. For Schiff base B, the best corrosion inhibition rate reached to 96.62% with the concentration of 15 mmol/L and assembly time of 6 h at 25 ℃. The results showed that two inhibitors had good corrosion inhibition performance, and the inhibition effect of B was better than that of A.

Key words: Schiff base, Self?assembled membrane, Corrosion inhibition, Electrochemical impedance spectroscopy, Polarization curve

摘要： 运用分子自组装技术在铜电极表面分别制备了双水杨醛缩邻苯二胺（简称A）和双邻香兰素缩邻苯二胺（简称B）两种席夫碱缓蚀膜。采用电化学方法研究了两种席夫碱自组装单分子层膜在质量分数3.5%的NaCl溶液中对铜的缓蚀行为。在25 ℃下，席夫碱A溶液浓度为10 mmol/L，组装时间为4 h时缓蚀效果最佳，席夫碱B溶液浓度为15 mmol/L，组装时间为6 h时缓蚀效果最佳，A、B的缓蚀效率分别达到94.06%和96.62%。结果表明，两种缓蚀剂对铜具有很好的缓蚀性能，且缓蚀效果B>A。

关键词: 席夫碱, 自组装膜, 缓蚀性能, 电化学阻抗, 极化曲线